About Us
Who We Are
ANFT is an early-stage company pioneering next-generation lithography and mask-making technologies, addressing the limitations of current semiconductor manufacturing, which hinder improvements in energy efficiency, throughput, and resolution. By overcoming these barriers, we aim to drive a breakthrough in semiconductor capital equipment, ushering an era of innovation across the industry.
Technology
Innovative Approach
Our technology is powered by the Integrated Emission and Optics Array (IEOA) writing module, which features a monolithic structure that integrates the field emission array with the projection lens array. This unique approach guarantees exceptional resolution and efficiency in our writing process.
The integrated module boasts an impressive capability of producing 180 nA e beams and achieving sub 10 nm resolution. Its monolithic design effectively reduces interaction between beams, mitigating stochastic issues and enhancing positional accuracy.